• 专利标题:   Graphene transistor used to fabricate self-aligned chemical vapor deposition transistor arrays comprises substrate; source electrode; drain electrode; graphene channel extending between the electrodes; and top gate disposed on channel.
  • 专利号:   WO2012119125-A2, WO2012119125-A3, US2014077161-A1
  • 发明人:   DUAN X, HUANG Y, LIAO L, BAI J
  • 专利权人:   DUAN X, HUANG Y, LIAO L, BAI J, UNIV CALIFORNIA
  • 国际专利分类:   H01L021/336, H01L029/78, H01L029/06, H01L029/16, H01L029/40, H01L029/775
  • 专利详细信息:   WO2012119125-A2 07 Sep 2012 H01L-029/78 201261 Pages: 92 English
  • 申请详细信息:   WO2012119125-A2 WOUS027606 02 Mar 2012
  • 优先权号:   US448562P, US494374P, US14002663

▎ 摘  要

NOVELTY - A graphene transistor (100), comprises: a substrate (112); a source electrode (102) disposed on the substrate; a drain electrode (104) disposed on the substrate; a graphene channel (108) disposed on the substrate and extending between the source electrode and the drain electrode; and a top gate disposed on the graphene channel and including a nanostructure. USE - As graphene transistor (claimed) used to fabricate self-aligned CVD graphene transistor arrays, and for fabrication of high speed, self-aligned graphene transistors and functional circuits, such as graphene based RF circuits. ADVANTAGE - Using Al2O3 nanoribbons as the gate dielectric, the top-gated graphene transistor exhibit superior performance with high carrier mobility. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of fabrication process to obtain top gated graphene transistor using dielectric oxide nanowires. Graphene transistor (100) Source electrode (102) Drain electrode (104) Top gate electrode (106) Graphene channel (108) Zirconium oxide nanowire (110) Substrate (112) Silicon oxide layer (114)