▎ 摘　　要

NOVELTY - Preparing fluorosilane surface modified graphene, comprises (i) dispersing graphene oxide in aqueous alcohol solution to obtain graphene dispersion liquid; (ii) dispersing fluorosilane in aqueous alcohol solution, stirring, adding a dilute acid, stirring and hydrolyzing; (iii) mixing graphene oxide dispersion and hydrolyzed fluorosilane solution, stirring, and reacting to obtain fluorosilane surface modified graphene oxide aqueous alcoholic solution; and (iv) carrying out reduction reaction on the fluorosilane surface modified graphene oxide aqueous alcoholic solution, cooling and filtering. USE - The fluorosilane surface modified graphene is useful for preparing supercapacitor. ADVANTAGE - The method is simple and uses low cost raw materials; is economical; increases the graphene layer spacing; improves the specific surface area of graphene; and produces fluorosilane surface modified graphene with good wettability and electrochemical stability, and which can produce graphene electrode with high electrochemical stability, large specific capacity, high power and long service life. DETAILED DESCRIPTION - Preparing fluorosilane surface modified graphene, comprises (i) uniformly dispersing graphene oxide in aqueous alcohol solution under ultrasonic field to obtain graphene dispersion liquid with a concentration of 0.5-2 mg/ml; (ii) dispersing fluorosilane in aqueous alcohol solution via stirring at a rate of 500-3000 revolutions/minute for 10-120 minutes, where the fluorosilane is difluorosilane, tetrafluorosilane, methyl trifluorosilane, trimethylfluorosilane, trifluoropropylmethyldichlorosilane, fluorosilicone rubber, trifluoromethyl trimethylsilane, trichloro(3,3,3-trifluoropropyl)silane, (3,3,3-trifluoropropyl)dichloromethyl silane, flusilazole, ammonium silicofluoride, trifluoropropyl methyl cyclotrisiloxane, methyl trifluoropropyl dichlorosilane, bis(3,3,3-trifluoropropyl)dichlorosilane, 3,3,3-trifluoropropylphenyl dichlorosilane, 3,3,3-trifluoropropylmethyl dichlorosilane, 1,2,2-trifluorovinyl triphenylsilane, tert-butyldimethylsilyl trifluoromethanesulfonate, 3,3,3-trifluoropropyl trichlorosilane, triethylsilyl trifluoromethanesulfonic acid, pentafluorophenyl dimethyl chlorosilane, ammonium fluorosilicate, gamma -trifluoropropyl methyl polysiloxane, 3,3,3-trifluoropropyl methyl dimethoxy siloxane, 1,3,5-trimethyl-tris(3,3,3-trifluoropropyl)cyclotrisiloxane, bis(3,3,3-trifluoropropyl)dimethoxysilane, heptadecafluorodecyl trimethoxysilane, tridecafluorooctyl trimethoxysilane, 4-methyl-(perfluorohexylethyl)propyl trimethoxysilane, dodecafluoroheptyl propyl methyl dimethoxysilane or dodecafluoroheptyl propyl trimethoxysilane, adding a dilute acid with a concentration of 0.01-0.1 mol/l, where the mol ratio of hydrogen ion in the dilute acid and silicon in the fluorosilane is 1:10-1:100, stirring at 20-90 degrees C at a speed of 500-3000 revolutions/minute and carrying out hydrolysis for 10-120 minutes to obtain hydrolyzed fluorosilane; (iii) mixing graphene oxide dispersion and hydrolyzed fluorosilane solution, where the mass ratio of fluorosilane and graphene oxide in the mixed solution is 1:0.05-1:10, stirring at 20-90 degrees C, and reacting for 1-48 hours to obtain fluorosilane surface modified graphene oxide aqueous alcoholic solution; and (iv) carrying out reduction reaction on the fluorosilane surface modified graphene oxide aqueous alcoholic solution at 120-200 degrees C for 1-24 hours, reducing graphene oxide into graphite, cooling to room temperature and filtering.