▎ 摘　　要

NOVELTY - Formation of graphene involves supplying (S101) a plasma of carbon-containing compound to a substrate, irradiating (S102) laser onto graphene forming region on the surface of the substrate to which the plasma is supplied, and forming graphene in the graphene forming region on the surface of the substrate. USE - Formation of graphene (claimed). ADVANTAGE - The method provides graphene pattern with excellent effect, directly formed on various substrates without damage. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene forming apparatus, which has a processing chamber having a stage on which the substrate placed in the chamber is placed, a plasma supply unit for supplying plasma, and laser irradiating unit for irradiating laser. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of the formation method of graphene. (Drawing includes non-English language text) Plasma supply process (S101) Laser irradiation process (S102)