• 专利标题:   Graphene nano sheet modification involves preparing substrate, forming conductive adhesive layer on upper surface of prepared substrate, and then attaching substrate for attaching another substrate on graphene nanosheet.
  • 专利号:   KR2017124710-A
  • 发明人:   DONG H P, SEOKHO K, JINHO C, KIM H
  • 专利权人:   UNIV INHA RES BUSINESS FOUND
  • 国际专利分类:   B01J019/08
  • 专利详细信息:   KR2017124710-A 13 Nov 2017 201803 Pages: 12
  • 申请详细信息:   KR2017124710-A KR054421 03 May 2016
  • 优先权号:   KR054421

▎ 摘  要

NOVELTY - Graphene nano sheet modification involves preparing substrate, forming conductive adhesive layer on the upper surface of the prepared substrate, and then attaching substrate for attaching another substrate on the graphene nanosheet mounted on the upper surface of the conductive adhesive layer. The graphen nanosheet is irradiated with a low energy ion beam. USE - Method for modifying graphene nano sheet based on ion beam irradiation. ADVANTAGE - The method provides modification of the graphene nano sheet in a simple and cost-effective manner with excellent electrical and optical characteristics with minimizes damage of the graphene nanosheet through the ion beam irradiation. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic scanning electron micrograph of the graphene nanosheet.