▎ 摘　　要

NOVELTY - Production device of high-purity graphene film comprises sealing cavity, bearing platform set in the sealing cavity and plasma heater. The bearing platform is used for bearing the initial graphene film. The plasma heater is located above the bearing platform and used for heating the initial graphene film to obtain high-purity graphene. USE - Used as production device of high-purity graphene film. ADVANTAGE - The device uses the plasma heater to directly heat the initial graphene film, which can efficiently use the heating energy, realizes low preparation cost and fast processing speed, achieves continuous production, and can uniformly remove the impurities in the initial graphene film, so the prepared high-purity graphene product has good consistency. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of high purity graphene film based on the production device comprising adhering initial graphene film on a bearing platform in a sealing cavity, introducing inert gas into the sealing cavity, using the plasma heater to heat the initial graphene film, and gasifying the impurity in the initial graphene film to obtain the purified high-purity graphene film.