• 专利标题:   Preparing graphene aqueous slurry used for liquid phase stripping method, involves placing expanded graphite liquid phase peeling solution with dispersant in liquid phase peeling device, and preparing graphene slurry.
  • 专利号:   CN113800505-A
  • 发明人:   SUN P, LIU G, XU J
  • 专利权人:   JIANGSU SHANYUAN TECHNOLOGY CO LTD
  • 国际专利分类:   C01B032/19
  • 专利详细信息:   CN113800505-A 17 Dec 2021 C01B-032/19 202213 Chinese
  • 申请详细信息:   CN113800505-A CN10878666 02 Aug 2021
  • 优先权号:   CN10878666

▎ 摘  要

NOVELTY - Preparing graphene aqueous slurry involves placing expanded graphite liquid-phase peeling solution with dispersant and dispersant in liquid phase peeling device; preparing graphene slurry, where dispersant is block copolymer of polyethylene oxide and polypropylene oxide in molar ratio of 1:9-4:6. USE - Method for preparing graphene aqueous slurry used for industrial large-scale production mainly with redox method and liquid phase stripping method. ADVANTAGE - The method enables to provide graphene aqueous slurry which is effectively increase wettability of graphene and water, realizes efficient stripping of graphene liquid phase, which is good for improving dispersibility and conductivity of slurry. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a graphene slurry. DESCRIPTION OF DRAWING(S) - The drawing shows an SEM image of graphene aqueous slurry prepared in Example 2 amplifying 10 thousand times.