• 专利标题:   Graphene vapor deposition device has reaction cavity whose end portion is provided with sample inlet and outlet, and driving device which drives base portion from sample inlet into reaction cavity through sample outlet.
  • 专利号:   CN203890440-U
  • 发明人:   LIU Z, WANG J, WANG W
  • 专利权人:   CHINESE ACAD SCI NINGBO MATERIAL TECHNOL
  • 国际专利分类:   C23C016/26, C23C016/54
  • 专利详细信息:   CN203890440-U 22 Oct 2014 C23C-016/54 201503 Pages: 7 Chinese
  • 申请详细信息:   CN203890440-U CN20304385 09 Jun 2014
  • 优先权号:   CN20304385

▎ 摘  要

NOVELTY - This utility new type claims a one continuous fast growing graphene of vapour deposition device, aiming at solving the graphene on the fast continuous growth of a base body, it solves the problem of energy and raw material can not be a valid use of. Coiled material through the U-type arrangement or S type arrangement in reaction chamber, a reaction chamber in one end of continuous feeding and sampling, continuous production, material of U type or S type arrangement arrangement uses the valid space of inner reaction cavity, at the same time, inner growth at the same time by multi-winding secondary coil increase the growth efficiency of valid use of the energy and saves the cost, graphene is rapidly growing base material to the inner reaction cavity, the valid use of the growth of gas reaction inner cavity, saves the cost and increase the production efficiency.