• 专利标题:   Performing graphene-enabled block copolymer lithography transfer to arbitrary substrate involves applying graphene on surface, adding block copolymers to graphene, and phase-separating block copolymers.
  • 专利号:   US2021208501-A1
  • 发明人:   LEE W K, WHITENER K E
  • 专利权人:   US SEC OF NAVY
  • 国际专利分类:   C01B032/194, B29C071/02, C08J007/14, G03F007/34, G03F007/00
  • 专利详细信息:   US2021208501-A1 08 Jul 2021 G03F-007/00 202176 English
  • 申请详细信息:   US2021208501-A1 US115572 08 Dec 2020
  • 优先权号:   US958467P, US115572

▎ 摘  要

NOVELTY - Performing graphene-enabled block copolymer lithography transfer to an arbitrary substrate involves applying graphene on a surface; adding block copolymers to the graphene on the surface; phase-separating the block copolymers; forming nanopatterned phase separated block copolymers; delaminating the graphene; and transferring the graphene and nanopatterned phase separated block copolymers to a second surface. USE - Method for performing graphene-enabled block copolymer lithography transfer to arbitrary substrate. ADVANTAGE - The method enables to perform graphene-enabled block copolymer lithography transfer to an arbitrary substrate, which reduces the need to determine surface-specific chemical and physical properties for each new surface that is introduced into the Basics on block copolymer (BCP) lithography process.