• 专利标题:   Field effect transistor, has gate insulating layer including insulative, high-dielectric constant, two-dimensional material on channel layer, gate electrode provided on layer, and electrodes electrically connected to channel layer.
  • 专利号:   EP3855507-A1
  • 发明人:   LEE M, SEOL M, JANG H W, CHO Y, SHIN H
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, UNIV SEOUL NAT R DB FOUND
  • 国际专利分类:   H01L029/10, H01L029/24, H01L029/51, H01L029/786
  • 专利详细信息:   EP3855507-A1 28 Jul 2021 H01L-029/786 202167 English
  • 申请详细信息:   EP3855507-A1 EP152508 20 Jan 2021
  • 优先权号:   KR009396

▎ 摘  要

NOVELTY - The FET (200) has a first channel layer (111), a second channel layer (112) that is provided on the first channel layer. A gate insulating layer (113) includes an insulative, high-k, two-dimensional material that are provided on the second channel layer. A gate electrode (114) is provided on the gate insulating layer. A first electrode (115) is electrically connected to the first channel layer and a second electrode (116) is electrically connected to the second channel layer.The first channel layer and the second channel layer comprises a semiconductor material having a two-dimensional crystal structure. USE - FET. ADVANTAGE - The field effect transistor has high mobility with expected reduced leakage current because the short channel effects are suppressed when two-dimensional materials are used as channels of field effect transistors. The gate insulating layer has a dielectric constant of greater than or equal to 10. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for producing FET. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a FET. First channel layer (111) Second channel layer (112) Gate insulating layer (113) Gate electrode (114) First electrode (115) Second electrode (116) FET (200)