• 专利标题:   Carbon-based semiconductor material useful as a semiconductor layer of a device, comprises reduced graphene oxide that is reduced so that the semiconductor material has a specified resistance/humidity variation.
  • 专利号:   WO2017149498-A1, EP3423540-A1, US2019072510-A1
  • 发明人:   TAI Y, LUBINEAU G
  • 专利权人:   UNIV KING ABDULLAH SCI TECHNOLOGY, UNIV KING ABDULLAH SCI TECHNOLOGY, UNIV KING ABDULLAH SCI TECHNOLOGY
  • 国际专利分类:   B82Y030/00, C09J177/00, D21H019/82, H01B001/04, H05K001/09, G01N027/12, H01L051/00
  • 专利详细信息:   WO2017149498-A1 08 Sep 2017 C09J-177/00 201762 Pages: 34 English
  • 申请详细信息:   WO2017149498-A1 WOIB051234 02 Mar 2017
  • 优先权号:   US303719P, US16078101

▎ 摘  要

NOVELTY - Carbon-based semiconductor material comprises reduced graphene oxide. The reduced graphene oxide is reduced so that the semiconductor material has a resistance/humidity variation of -15 to 15%. USE - The carbon-based semiconductor material is useful as a semiconductor layer of a device (claimed). ADVANTAGE - The carbon-based semiconductor material: is humidity insensitive material; and improves the humidity failure issue of actual carbon-based electronic devices. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a device comprising a semiconductor layer consisting essentially of the carbon-based semiconductor material; and (2) making the carbon-based semiconductor material, comprising applying an ink comprising comprises graphene oxide in a solvent, to a surface of a substrate, drying the ink to produce a graphene oxide material or layer on the substrate, and sintering the material or layer at a temperature and for a period of time where the material or layer has a resistance/humidity variation of -5 to 5%.