• 专利标题:   Preparing microspheres involves placing graphene oxide microspheres under atmosphere of inert gas, dispersing graphene microsphere into ethyl orthosilicate, dispersing orthoethyl silicate, and coating graphene microspheres with silica layer.
  • 专利号:   CN110526232-A
  • 发明人:   HAN J, SHEN Y, CHEN Q, FENG Y, MA J, ZHONG M
  • 专利权人:   UNIV ZHEJIANG TECHNOLOGY
  • 国际专利分类:   B82Y030/00, B82Y040/00, C01B032/184, C01B033/12
  • 专利详细信息:   CN110526232-A 03 Dec 2019 C01B-032/184 201999 Pages: 7 Chinese
  • 申请详细信息:   CN110526232-A CN10610475 08 Jul 2019
  • 优先权号:   CN10610475

▎ 摘  要

NOVELTY - Preparing thermal insulation microspheres involves placing graphene oxide microspheres at 1300 degrees C or higher for 5 minutes or more under atmosphere of inert gas. The graphene microsphere is dispersed into ethyl orthosilicate after sintering, and the orthoethyl silicate is dispersed with graphene microspheres as precursor. Under stirring conditions, the graphene microspheres are coated with silica layer. Stirring is stopped and the graphite microsphere of collecting reaction liquid surface covered with silicon dioxide. USE - Method for preparing microspheres. ADVANTAGE - The microsphere uses graphene as a template to prepare ultra-low-density graphene-based silica microspheres. The thermal conductivity of the microspheres is reduced to less than 0.02 watt/meter-kelvin, which has excellent heat insulation effect.