▎ 摘　　要

NOVELTY - Preparation of germanium-based graphene nanopore comprises providing germanium-based graphene comprising germanium substrate and graphene formed on germanium substrate, performing ion implantation on germanium-based graphene, generating point defects in graphene, annealing to etch the point defects, and obtaining the product. USE - Preparation of germanium-based graphene nanopore useful for single-layer film material. ADVANTAGE - The method provides germanium-based graphene nanopore with good quality and easy size adjustment and without etching graphene.