▎ 摘　　要

NOVELTY - Production of non-damaging graphene nano-devices involves low pressure chemical vapor depositing silicon nitride on silicon substrate, spin-coating with polymethyl methacrylate, curing, measuring polymethyl methacrylate thickness, spin-coating, exposing to electron beam, testing, applying methyl isobutyl ketone, adding isopropyl alcohol, fixing, drying, observing under optical microscope, performing electron beam lithography, developing, etching, exposing, spraying gold, measuring silicon nitride thickness, calculating polymethyl methacrylate and silicon nitride selectivity and spin-coating. USE - Method for producing non-damaging graphene nano-devices (claimed). DETAILED DESCRIPTION - Production of non-damaging graphene nano-devices comprises low pressure chemical vapor depositing silicon nitride on silicon substrate, spin-coating with polymethyl methacrylate, curing, measuring polymethyl methacrylate thickness, spin-coating, exposing to electron beam, testing, applying methyl isobutyl ketone, adding isopropyl alcohol, fixing, drying, observing under optical microscope, performing electron beam lithography, developing, etching, exposing, spraying gold, measuring silicon nitride thickness, calculating polymethyl methacrylate and silicon nitride selectivity, spin-coating, etching, exposing, spraying gold, spin-coating, thermal evaporating gold to graphene, forming, performing optical lithography, stripping gold, spin-coating, forming overlay, fixing with isopropyl alcohol, observing, spin-coating and ultrasonic cleaning.