• 专利标题:   Graphene net preparation by growing graphene on copper mesh template by chemical vapor deposition, pressing template on polydimethylsiloxane to obtain graphene net patch and transferring graphene net on silicon chip by pasting patch on chip.
  • 专利号:   CN102583349-A, CN102583349-B
  • 发明人:   GUO X, LIU J, TANG Q
  • 专利权人:   UNIV SOUTHEAST
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN102583349-A 18 Jul 2012 C01B-031/04 201307 Pages: 4 Chinese
  • 申请详细信息:   CN102583349-A CN10043497 24 Feb 2012
  • 优先权号:   CN10043497

▎ 摘  要

NOVELTY - Graphene net is prepared by placing copper mesh template in chemical vapor deposition chamber, then growing graphene on copper mesh for 5-15 minutes in methane and hydrogen atmosphere, and annealing; preparing polydimethylsiloxane (PDMS)-graphene net patch by flat glass sheet pressing copper mesh on PDMS surface, adding ammonium persulfate solution, and removing copper; and transferring graphene network to a silicon chip by pasting PDMS-graphene net patch on the silicon chip, heating at 80 degrees C, applying 1-2 kg of pressure for 30-40 minutes, and uncovering the PDMS-graphene net patch. USE - Method for preparing graphene network (claimed). DETAILED DESCRIPTION - Preparation of graphene net comprises: (A) preparing copper mesh of needed specification as template, placing template in constant temperature section in chemical vapor deposition chamber, sealing, vacuumizing to 10-15 Pa, introducing argon gas, heating to 950-1000 degrees C in hydrogen/argon (H2/Ar) atmosphere, and preserving heat for 30-40 minutes, then growing graphene on copper mesh for 5-15 minutes in methane and H2 atmosphere, annealing in H2/Ar atmosphere and cooling to room temperature; (B) preparing PDMS-graphene net patch by flat glass sheet pressing copper mesh on PDMS surface, adding ammonium persulfate solution, removing copper, and then washing with deionized water; and (C) transferring graphene net to a silicon chip by pasting PDMS-graphene net patch on the silicon chip, then heating at 80 degrees C, applying 1-2 kg of pressure for 30-40 minutes, and uncovering the PDMS-graphene net patch to transfer the graphene network on the silicon chip.