• 专利标题:   Covalent modification of single-layer graphene comprises forming graphene on substrate, and adding polymethyl methacrylate solution to a surface of modified graphene and then heating and curing to form polymethyl methacrylate film.
  • 专利号:   CN102849732-A, CN102849732-B
  • 发明人:   LIU Z, YU J, PENG H, XIE Q, ZHANG L
  • 专利权人:   UNIV PEKING
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN102849732-A 02 Jan 2013 C01B-031/04 201344 Pages: 9 Chinese
  • 申请详细信息:   CN102849732-A CN10348152 18 Sep 2012
  • 优先权号:   CN10348152

▎ 摘  要

NOVELTY - Covalent modification of single-layer graphene comprises forming graphene on a substrate, adding polymethyl methacrylate solution to a surface of single layer modified graphene and then heating and curing to form polymethyl methacrylate film, etching the substrate using hydrofluoric acid aqueous solution, forming the polymethyl methacrylate film on a protective substrate, performing covalent chemical modification on the modified graphene to realize that the graphene is non-uniform, transferring the non-uniform graphene to other surface of the substrate, and removing the film. USE - The method is useful for covalent modification of single-layer graphene (claimed).