▎ 摘　　要

NOVELTY - The device (10) has a first layer (14) that is arranged between particle source and material (12), which changes resistance when the particle penetrates the first layer. The electrical wire (16) is provided for determining the change in resistance of the first layer. The mask (22) is arranged on the side of the first layer opposite to the material which is impenetrable for the particle at selected kinetic energies. USE - Device such as sensor for determining penetration of particle from particle source into material for production of detector for mass spectroscopy, detector for single particle implantation, information memory or component for quantum computer, preferably processor for quantum computer (all claimed). ADVANTAGE - The penetration of particles into a material can be detected quickly and reliably. The method implants particles deterministically into a substrate in such a way that it is possible to work with high spatial resolution and high throughput. A deterministic particle source can be implemented in a simple and inexpensive manner. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for determining the penetration of particle from particle source into material. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the sensor. 10Particle penetration determining device 12Material 14First layer 16Electrical wire 22Mask