• 专利标题:   Graphene extracting device for chemical vapor deposition system has four enamel reactors, hydrochloric acid storage tank, graphite heat exchanger, cold water tower, plate-and-frame filter, draught fan, and hydrochloric acid thickening tank.
  • 专利号:   CN209260198-U
  • 发明人:   LI L
  • 专利权人:   LI L
  • 国际专利分类:   C01B032/186, C23C016/26
  • 专利详细信息:   CN209260198-U 16 Aug 2019 C23C-016/26 201973 Pages: 8 Chinese
  • 申请详细信息:   CN209260198-U CN21730903 24 Oct 2018
  • 优先权号:   CN21730903

▎ 摘  要

NOVELTY - A chemical vapor deposition system extracts of graphene device, mainly comprising a reaction system device device, a tail gas processing system, a filtering system device and a cooling system device. filter system device, a tail gas processing system device and a cooling system device are connected with the reaction system device. The utility model effectively solves the problem that the graphene in the extracting process is not capable of realizing continuous and scale and reaction tail gas treatment. At the same time, solving the problem that graphene extraction process acid and catalyst reaction is not complete and the problem of residual impurity ion, it can be popularized and applied to the graphene extracting device or device field.