• 专利标题:   Atomic force microscope based graphical method, involves emitting titanium dioxide beam emitted by UV laser beam on probe on same area as ultraviolet laser beam, so that oxidation graphene area is reduced to be graphene, and to form graphene pattern.
  • 专利号:   CN116216703-A
  • 发明人:   WANG M, LIU C, YAO S, PENG X, ZHANG Z
  • 专利权人:   SHANGHAI INTEGRATED CIRCUIT EQUIP MATE
  • 国际专利分类:   B82Y040/00, C01B032/184, G01Q060/24, H05K003/02
  • 专利详细信息:   CN116216703-A 06 Jun 2023 C01B-032/184 202356 Chinese
  • 申请详细信息:   CN116216703-A CN10226813 09 Mar 2023
  • 优先权号:   CN10226813

▎ 摘  要

NOVELTY - The method involves providing a graphene oxide layer (30). The graphene oxide layer providing an atom force microscope and an ultraviolet laser (20). The ultraviolet laser providing the atomic force microscopy with a probe (10). The probe providing a tip of the probe with a titanium dioxide (11), emitting the titanium dioxide beam emitted by the UV laser beam on the probe on the same area as the ultraviolet laser beam, so that the oxidation graphene the area is reduced to be graphene, and to form a graphene. The graphene layer is reducing the gas environment. USE - Atomic force microscope based graphical method. ADVANTAGE - The method enables utilizing titanium dioxide UV light catalytic action to efficiently reduce the oxidation graphene using titanium dioxide material with low cost and simple characteristics, thus reducing the cost of preparing graphene pattern by oxidation graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a atomic force microscope based graphical device. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of a atomic force microscope based graphical device. 10Probe 11Titanium dioxide 20Ultraviolet laser 30Graphene oxide layer 40Stage 50Cantilever 60Three dimensional moving component