▎ 摘　　要

NOVELTY - The method involves forming surface enhanced Raman characteristics of composite structure through metal particles of graphene nano-sheets (2). A silicon substrate is selected. The silicon substrate is etched to prepare a silicon pyramid array (1). The silicon pyramid array is taken out and put into microwave plasma chemical vapor deposition system to grow graphene nano-sheet. The metal particle (3) is coated on the surface layer of graphene nano-sheets, so as to obtain a surface enhanced Raman substrate (4). USE - Method for preparing surface enhanced Raman substrate used in research and detection areas. ADVANTAGE - The large area of surface enhanced Raman substrate is prepared uniformly, so as to avoid the pollution of pure metal particle. The preparation process of surface enhanced Raman substrate is performed conveniently in simple manner. The cost of surface enhanced Raman substrate is reduced. The sensitivity of surface enhanced Raman substrate is improved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a surface enhanced Raman substrate structure. DESCRIPTION OF DRAWING(S) - The drawing shows an explanatory view illustrating the process for preparing surface enhanced Raman substrate. Silicon pyramid array (1) Graphene nano-sheet (2) Metal particle (3) Surface enhanced Raman substrate (4)