▎ 摘　　要

NOVELTY - Liquid-phase substrate separation of graphene comprises taking silicon chip or glass as deposition substrate, ultrasonically cleaning substrate surface using organic solvent, cold-air drying, uniformly coating dimethicone on surface of substrate, setting coated sample in deposition position, adjusting height of graphene preparation system , adding graphite oxide particles into graphene preparation system, starting graphene preparation system, microwave irradiating to form desired graphene, collecting graphene, quickly stripping graphene film in vacuum chamber at constant temperature. USE - The method is for liquid-phase substrate separation of graphene. ADVANTAGE - The method is capable of depositing high-quality graphene thin film in large area, reduces occurrence of agglomeration graphene and greatly improves specific surface area.