▎ 摘　　要

NOVELTY - The wet etching chemical transfer method comprises depositing a metal layer on a metal-catalyzed substrate and graphene, coating polymethylmethacrylate organic colloid on one surface of the metal layer, adding a combination of the organic colloid/metal layer/graphene/metal-catalyzed substrate into an etching solution, removing the organic colloids, adding combination of matrix metal and graphene into the etching solution, and removing the organic colloids on the surface of the metal layer. The deposited metal layer has a thickness of 30 nm. The organic colloids have a thickness of 200 nm. USE - The wet etching chemical transfer method is useful for improving surface cleanliness of graphene (claimed). ADVANTAGE - The wet etching chemical transfer method can effectively avoid the transfer of the organic colloid on the surface of the graphene.