▎ 摘　　要

NOVELTY - The method involves forming a graphene layer (104a) on a substrate (102). A graphene peeling layer (108) is formed on a pattern surface of the substrate by spin coating process. The graphene layer is selectively peeled by a rotator polymer stamp (106). A raised pattern is formed on the polymer stamp. The polymer stamp is made of polydimethylsiloxane (PDMS). The graphene peeling layer is made of organic solvent such as dimethyl sulfoxide or tetrahydrofuran. The graphene peeling layer is extended on a surface of the raised pattern based on rotation of the polymer stamp. USE - Method for forming a graphene pattern using exfoliation technique. ADVANTAGE - The method enables evenly forming width of the graphene layer. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene pattern forming device. DESCRIPTION OF DRAWING(S) - The drawing shows a cross sectional view of a substrate. Substrate (102) Graphene layer (104a) Polymer stamp (106) Graphene peeling layer (108)