▎ 摘　　要

NOVELTY - Preparing vacuum thermal sintering graphene temperature-equalizing plate comprises (i) coating and drying the graphene oxide slurry to obtain a graphene oxide film, where the graphene oxide slurry does not contain a binder; (ii) stacking many sheets of the graphene oxide films to obtain a graphene oxide layer; (iii) stacking many layers of the graphene oxide layers separated by partitions to obtain a stack with a height of H; (iv) performing a vacuum thermal sintering process on the oxidation graphene layer, comprising firstly vacuumizing, heating to 2600-2700degrees Celsius, applying the pressure to the graphene oxide layer during the vacuum thermal sintering process is between 20-150MPa; and (v) rolling the graphene layer. USE - The method is useful for preparing vacuum thermal sintering graphene temperature-equalizing plate is useful in electronic product radiating system for radiating electronic product. ADVANTAGE - The method: enables to prepare vacuum thermal sintering temperature graphene equalizing plate with excellent internal cohesion and tensile strength performance, and excellent planar heat conducting performance and replace part of heat pipe function for radiating field which is more suitable for the customized production of complex structure heat dissipation requirements; reduces the energy consumption and the production cost; improves the possibility of bonding between layers in the graphitization stage, and cohesion of the temperature plate to improve the yield of the product. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) Graphene uniform temperature plate; (2) Radiating device; and (3) Electronic device. DESCRIPTION OF DRAWING(S) - The drawing shows a step diagram of the preparation method of the uniform temperature plate graphene. (Drawing includes non-English language text).