▎ 摘　　要

NOVELTY - Method for detecting abnormal growth of graphene involves measuring a reflection spectrum of a measuring object having a graphene film formed by chemical vapor deposition on a substrate through spectral ellipsometry, creating a film structure model for calculating a polarization parameter, incorporating the calculated value of the polarization parameter to a measured value by fitting, and detecting the abnormal growth of the graphene based on a value of degree of conformance, when the polarization parameters are fitted. USE - The method is useful for detecting abnormal growth of graphene. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) a measurement apparatus comprising a light source for emitting light to a measurement object having a graphene film formed by chemical vapor deposition on a substrate, a polarizer for making the light emitted from the light source as polarized light, a analyzer for passing reflected light on the measurement object, a measurement part for measuring the reflection spectrum of the measurement object from the light passed through the analyzer, and a calculation part for performing calculation based on the measurement results of the measurement part, where the calculation part creates a film structure model, calculates a polarization parameter, and adjusts the calculated value of the polarization parameter to the measurement value by fitting, and detects an abnormal degree of measurement when the polarization parameter is measured; and (2) a film forming system comprising a film forming apparatus for forming a graphene film on a substrate by chemical vapor deposition and the measuring apparatus.