▎ 摘　　要

NOVELTY - Electroplating graphene oxide on a photoresist surface comprises spin coating photoreist solution on a substrate material through spin coating method, baking and drying the spin-coated substrate material, placing the substrate material on an anode of an electroplating device, soaking the substrate materials in a graphene oxide aqueous solution, plating the substrate, and baking the electroplated substrate. USE - Electroplating method of graphene oxide on photoresist surface substrate material. ADVANTAGE - The method can improve the carbon content in the photoresist layer, so as to improve the etching resistance of the photo resist layer, and avoids the graphene oxide directly added in the mixing caused by the strong bonding force is not strong, unstable and so on. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the substrate material prepared by the electroplating method. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart of an electroplating method for plating graphene oxide on photoresist surface wherein it comprises the following steps. (Drawing includes non-English language text).