▎ 摘　　要

NOVELTY - Transfer of metal foil substrate graphene includes spin coating glue on surface of graphene, heating to obtain protection layer on graphene surface, where protection glue is photoresist comprising polymethylmethacrylate solution and anisole or trichloromethane solvent, adding graphene with surface protection layer and metal foil substrate in metal foil etching liquid, completely etching the metal foil substrate to form graphene/protection glue layer composite layer, cleaning with water, transferring clean graphene/protection glue layer on target substrate, centrifuging, and naturally airing. USE - Transfer of metal foil substrate graphene (claimed). ADVANTAGE - The method uses protection glue, which is simple to prepare and easy to remove, so that there is no residual protective colloid graphene. DETAILED DESCRIPTION - Transfer of metal foil substrate graphene comprises spin coating glue on surface of graphene to a thickness of 0.5-2 mu m, heating at 60-100 degrees C for 5-15 minutes or drying at room temperature for 30-60 minutes to obtain protection layer on graphene surface, where protection glue is photoresist comprising 3-10 vol.% polymethylmethacrylate solution and anisole or trichloromethane solvent, adding graphene with surface protection layer and metal foil substrate in metal foil etching liquid, completely etching the metal foil substrate to form graphene/protection glue layer composite layer, adding deionized water in graphene/protection glue layer to soak, cleaning to obtain clean graphene/protection glue layer, transferring the clean graphene/protection glue layer on target substrate, centrifuging at 800-5000 revolutions/minute for 15-60 seconds, naturally airing the target substrate for not less than 30 minutes, immersing in acetone, and etching the protection layer so that only graphene is left on the target substrate.