• 专利标题:   Two-component polysiloxane-modified phenolic resin comprises phenol, aqueous formaldehyde solution, crosslinked polysiloxane, benzoxazine, organic acid and polysiloxane nanospheres prepared using vinyltriethoxysilane, graphene, water, and polyvinylpyrrolidone.
  • 专利号:   CN113337075-A, CN113337075-B
  • 发明人:   ZHANG J, ZHAO M, ZHANG B, ZHANG P, LU H
  • 专利权人:   SHANDONG YUSHIJU CHEM IND CO LTD
  • 国际专利分类:   C08G008/28, C08K003/04, C08L061/14, C08L083/04, C08L083/08
  • 专利详细信息:   CN113337075-A 03 Sep 2021 C08L-061/14 202186 Pages: 10 Chinese
  • 申请详细信息:   CN113337075-A CN10471966 29 Apr 2021
  • 优先权号:   CN10471966

▎ 摘  要

NOVELTY - A two-component polysiloxane-modified phenolic resin comprises 110-120 pts. wt. phenol, 70-80 pts. wt. of 20-35 %mass aqueous formaldehyde solution, 24-33 pts. wt. crosslinked polysiloxane, 15-28 pts. wt. polysiloxane nanospheres, 8-15 pts. wt. benzoxazine, and 0.05-0.4 pt. wt. organic acid. The organic acid is formic acid or dodecylbenzenesulfonic acid. The crosslinked polysiloxane is prepared by heating phenyltris(dimethylsiloxy)silane and tetramethylammonium hydroxide under protection of nitrogen to 70 degrees C, dripping 1,2-bistrimethoxysilylethane and 3-mercaptopropylmethyldimethoxysilane at 70-90 degrees C to obtain mixed liquid, and reacting at 110-120 degrees C for 1-3 hours. The mass ratio of phenyltris(dimethylsiloxane)silane, tetramethylammonium hydroxide, 1,2-bistrimethoxysilylethane, and 3-mercaptopropylmethyldimethoxysilane is 100-110:0.04-0.12:42-50:33-38. The polysiloxane nanospheres are prepared by reacting vinyltriethoxysilane, graphene, deionized water, and polyvinylpyrrolidone. USE - Two-component polysiloxane-modified phenolic resin. ADVANTAGE - The polysiloxane-modified phenolic resin has improved elasticity and toughness, and excellent mechanical property and flexibility. DETAILED DESCRIPTION - A two-component polysiloxane-modified phenolic resin comprises 110-120 pts. wt. phenol, 70-80 pts. wt. of 20-35 %mass aqueous formaldehyde solution, 24-33 pts. wt. crosslinked polysiloxane, 15-28 pts. wt. polysiloxane nanospheres, 8-15 pts. wt. benzoxazine, and 0.05-0.4 pt. wt. organic acid. The organic acid is formic acid or dodecylbenzenesulfonic acid. The crosslinked polysiloxane is prepared by heating phenyltris(dimethylsiloxy)silane and tetramethylammonium hydroxide under protection of nitrogen to 70 degrees C, dripping 1,2-bistrimethoxysilylethane and 3-mercaptopropylmethyldimethoxysilane at 70-90 degrees C to obtain mixed liquid, and reacting at 110-120 degrees C under stirring condition for 1-3 hours. The mass ratio of phenyltris(dimethylsiloxane)silane, tetramethylammonium hydroxide, 1,2-bistrimethoxysilylethane, and 3-mercaptopropylmethyldimethoxysilane is 100-110:0.04-0.12:42-50:33-38. The polysiloxane nanospheres are prepared by adding vinyltriethoxysilane, graphene, deionized water, and polyvinylpyrrolidone to reaction flask, stirring at 25-40 degrees C, adjusting pH value of 3.5-5.5 with aqueous hydrochloric acid, stirring for 1-3 hours, adding 25-28 %mass aqueous ammonia to adjust the pH to 6.5-8.0, centrifuging, and filtering. The mass ratio of vinyltriethoxysilane, graphene, deionized water, and polyvinylpyrrolidone is 80-120:10-15:500-800:0.5-2. The polyvinylpyrrolidone is polyvinylpyrrolidone K30 or polyvinylpyrrolidone K90. The molar concentration of the aqueous hydrochloric acid solution is 2-4 mol/L. An INDEPENDENT CLAIM is included for preparation of the two-component polysiloxane-modified phenolic resin, which involves adding phenol, formaldehyde aqueous solution and benzoxazine to reactor, heating to 50-90 degrees C, adding organic acid, stirring and reacting for 0.5-1.5 hours, adding crosslinked polysiloxane and polysiloxane nanospheres, heating to 120-140 degrees C, reacting for 1-2 hours, reducing the vacuum in the reactor to 0-0.05 MPa, stirring and reacting until the temperature of the reaction liquid reaches 150 degrees C.