▎ 摘　　要

NOVELTY - Forming a layer, comprises either: (a) exposing a substrate to an aromatic precursor in a processing chamber, (b) rinsing the aromatic precursor from the processing chamber, (c) heating the substrate at a temperature below 600 degrees C to polymerize the aromatic precursor and deposit a graphene hard mask layer on the substrate, and (d) rinsing the processing chamber; or (i) forming a flowable graphene hard mask layer on a substrate by exposing the substrate to an aromatic precursor, and (ii) exposing the substrate to a plasma. USE - The method is useful for forming a layer. ADVANTAGE - The method forms graphene hard mask layers at lower temperatures, and improves graph deposition processes. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for non-transitory computer readable storage medium comprising instructions which, when executed by a control of a processing chamber, cause the processing chamber to perform the following operations: exposing a substrate to an aromatic precursor in a processing chamber, rinsing the aromatic precursor from the processing chamber, heating the substrate to a temperature below 600 degrees C to polymerize the aromatic precursor and deposit a graphene hard mask layer on the substrate, and rinsing the processing chamber. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the method for forming a layer (Drawing includes non-English language text).