• 专利标题:   FET e.g. N-type semiconductor channel transistor, comprises source electrode and drain electrode disposed on substrate, and channel layer comprising phosphorus-doped graphene and electrically connected to electrodes.
  • 专利号:   US2014145148-A1, KR2014068683-A, KR1430140-B1, US9012889-B2
  • 发明人:   LEE H
  • 专利权人:   UNIV SUNGKYUNKWAN RES BUSINESS FOUND, UNIV SUNGKYUNKWAN RES BUSINESS FOUND
  • 国际专利分类:   H01L029/66, H01L029/775, C01B031/02, H01L029/78
  • 专利详细信息:   US2014145148-A1 29 May 2014 H01L-029/775 201438 Pages: 47 English
  • 申请详细信息:   US2014145148-A1 US960996 07 Aug 2013
  • 优先权号:   KR136477

▎ 摘  要

NOVELTY - FET comprises a source electrode (300) and a drain electrode (400) disposed on a substrate (100), and a channel layer (500) comprising a phosphorus-doped graphene. The channel layer is electrically connected to the source electrode and the drain electrode. USE - FET such as P-type semiconductor channel transistor and an N-type semiconductor channel transistor. ADVANTAGE - The FET is stable in the air, and exhibits excellent N-type semiconductor characteristics. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for: (1) a method-I for producing the FET, comprising forming the source electrode and the drain electrode on the substrate, and forming the channel layer including a phosphorus-doped graphene; (2) a method-II for preparing the phosphorus-doped graphene, comprising injecting a precursor including a phosphorus compound into a graphene material, where the phosphorus compound is in a gas phase, a liquid phase, or a state of being dissolved in a solvent, and heating the precursor-injected graphene material; and (3) the phosphorus-doped graphene prepared by the method-II. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a FET. Substrate (100) Source electrode (300) Drain electrode (400) Graphene channel layer (500) Phosphorus doping. (600)