▎ 摘　　要

NOVELTY - Surface modification method involves modifying a surface layer of a wave-absorbing material to obtain wave absorption material with a modified surface layer. The modifying treatment involves reacting the surface layer with etching source. The modified surface layer is removed. The steps of obtaining wave absorbing material with modified surface layer and removing modified surface layer are repeated to obtain target wave-absorbing material. The target wave-absorbing material is used as core substrate. The nano-coating process is performed by precursor, and step of using target wave-absorbing material as core substrate is repeated until target modified wave-absorbing material is obtained. USE - Method for performing surface modification of wave absorbing material used in the field of communication, medical treatment, military affairs, industry and electronic apparatus. ADVANTAGE - The surface oxide layer is effectively removed from light and thin wave-absorbing material, thickness and weight of wave-absorbing material is accurately controlled, and precision reaches 0.1 nanometer (nm). The nano coating treatment accurately controls the thickness of coating layer, precision reaches 0.1 nm, and thickness of coating layer is uniform. The two processes are combined, so that wave-absorbing material is light in weight and thin in thickness, and has better corrosion resistance and excellent conductivity. DESCRIPTION OF DRAWING(S) - The drawing shows flowchart of a method for performing surface modification method of a wave-absorbing material. (Drawing includes non-English language text). Modifying surface layer of wave-absorbing material to obtain wave absorption material with modified surface layer (S1) Removing modified surface layer (S2) Repeating steps of obtaining wave absorbing material with modified surface layer and removing modified surface layer to obtain target wave absorbing material (S3) Using target wave absorbing material as core matrix, and performing nano coating treatment through a precursor (S4) Repeating step of using target wave absorbing material as core substrate until target modified wave absorbing material is obtained (S5)