• 专利标题:   High-conductivity electrical interconnect structure for electrically interconnecting electrical components, has metallic overlay portion that connects peripheral edges of graphene elements with each other.
  • 专利号:   US2017223828-A1
  • 发明人:   TANIELIAN M H
  • 专利权人:   BOEING CO
  • 国际专利分类:   C23C014/34, C25D005/54, H05K001/02, H05K001/09, H05K003/14, H05K003/16, H05K003/18
  • 专利详细信息:   US2017223828-A1 03 Aug 2017 H05K-001/09 201755 Pages: 10 English
  • 申请详细信息:   US2017223828-A1 US014096 03 Feb 2016
  • 优先权号:   US014096

▎ 摘  要

NOVELTY - The electrical interconnect structure has a metallic overlay portion that connects peripheral edges (104) of the graphene elements (100) with each other. The graphene elements are conductively isotropic with respect to X, Y, and Z axes. The graphene elements are doped with bromine. The graphene elements are positioned on a dielectric substrate (200). The metallic overlay portion is made of copper, aluminum, gold, palladium, or silver. USE - High-conductivity electrical interconnect structure for electrically interconnecting electrical components. ADVANTAGE - The highly-conductive structure is formed efficiently and effectively. The conductivity of high-conductivity electrical interconnect structure is improved. The electrical interconnection capability of high-conductivity electrical interconnect structure is improved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method of forming high-conductivity electrical interconnect structure on substrate. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the graphene element stacked on substrate. Graphene element (100) Peripheral edge (104) Lateral edge (106) Upper surface (108) Dielectric substrate (200)