▎ 摘　　要

NOVELTY - The preparation of graphene-based cleansing mask involves using 10-20 parts mass black tea extract, 5-10 parts mass Pleurotus eryngii polysaccharide, 10-15 parts mass Salvia miltiorrhiza extract, 12-15 parts mass sprouted mung bean extract, 10-15 parts mass hyaluronic acid, 10-15 parts mass glycerin, 7-15 parts mass sodium polyacrylate, 5-8 parts mass graphene particles, and 10-20 parts mass distilled water. USE - Preparation of graphene-based cleansing mask. ADVANTAGE - The method enables preparation of safe and non-irritating graphene-based cleansing mask using antiallergic effect of sprouted mung bean extract.