• 专利标题:   Method for fabricating laser-induced graphene patterning on substrate for creating electrochemical micro supercapacitor, involves scribing desired laser-induced graphene patterning in open ambient air by controlling fluence of laser.
  • 专利号:   WO2023039571-A1, US2023079919-A1
  • 发明人:   CLAUSSEN J, CHEN B, GOMES C L
  • 专利权人:   UNIV IOWA STATE RES FOUND INC, UNIV IOWA STATE RES FOUND INC
  • 国际专利分类:   H01L021/20, B01L003/00, B23K026/0622, B23K026/351, B23K026/364, H01G011/86
  • 专利详细信息:   WO2023039571-A1 16 Mar 2023 H01L-021/20 202328 Pages: 118 English
  • 申请详细信息:   WO2023039571-A1 WOUS076272 12 Sep 2022
  • 优先权号:   US261085P, US931228

▎ 摘  要

NOVELTY - The method (30) involves selecting a substrate for laser-induced graphene (LIG) patterning, and selecting a laser having an adjustable fluence. A desired LIG patterning is determied for the substrate. A desired electrical conductivity, surface morphology, and surface wettability are determined for the desired LIG patterning. The desired LIG patterning is scribed in open ambient air (34) by controlling fluence of laser at the LIG patterning to tunably produce the desired electrical conductivity, surface morphology, and surface wettability for the desired patterning. USE - Method for fabricating a LIG patterning on a substrate for creating a high-performance electrochemical micro supercapacitor of multiplexed open microfluidic environmental biosensing and energy storage devices. ADVANTAGE - The method enables introducing a one-step, mask-free process to create, pattern, and tune LIG with a ubiquitous carbon-di-oxide laser. The method enables adjusting laser parameters to create LIG with different electrical conductivity, surface morphology, and surface wettability without the need for post chemical modification. DETAILED DESCRIPTION - INDEPENDENT CLAIM is also included for a system for fabricating a LIG patterning on a substrate. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart illustrating a method for fabricating LIG patterned and tuned graphene with a laser scribing system. 30Method for fabricating LIG patterning on substrate 31Step for choosing graphene precursors material based substrate 33Laser scribing subsystem 34Step for scribing desired pattern 39Step for functionalizing LIG pattern