▎ 摘　　要

NOVELTY - Preparing a graphene film through low-temperature fixed-point nucleating comprises (i) coating a layer of carbon source solution on a metal substrate and drying till the carbon source solution is cured, (ii) patterning the cured carbon source solution on the surface of the metal substrate to form multiple solid-state carbon sources, (iii) placing the whole metal substrate into a chemical vapor deposition reaction cavity and carrying out graphene nucleating, (iv) diffusing the carbon atoms to the whole metal substrate to form a graphene film, and (v) cooling the formed graphene film. USE - The method is useful for preparing a graphene film through low-temperature fixed-point nucleating (claimed). ADVANTAGE - The method is simple, has convenient operation, and reduces energy consumption. DETAILED DESCRIPTION - Preparing a graphene film through low-temperature fixed-point nucleating comprises (i) coating a layer of carbon source solution on a metal substrate and drying till the carbon source solution is cured, (ii) patterning the cured carbon source solution on the surface of the metal substrate to form multiple solid-state carbon sources, (iii) placing the whole metal substrate into a chemical vapor deposition reaction cavity and carrying out graphene nucleating so that the carbon atoms of the solid-state carbon sources are recombined and subjected to fixed-point nucleating, (iv) diffusing the carbon atoms to the whole metal substrate to form a graphene film, and (v) cooling the formed graphene film.