• 专利标题:   Preparation of aluminum gallium nitride UV-detector with graphene electrode on gallium nitride self-supporting substrate involves preparing gallium nitride self-supporting substrate, depositing, and preparing graphene Schottky contact.
  • 专利号:   CN107195724-A, CN107195724-B
  • 发明人:   YANG G, LU Y, YAO C, WANG J, SUN R, QIAN W
  • 专利权人:   UNIV JIANGNAN, UNIV JIANGNAN
  • 国际专利分类:   H01L031/0304, H01L031/108
  • 专利详细信息:   CN107195724-A 22 Sep 2017 H01L-031/108 201774 Pages: 6 Chinese
  • 申请详细信息:   CN107195724-A CN10342853 16 May 2017
  • 优先权号:   CN10342853

▎ 摘  要

NOVELTY - Preparation of aluminum gallium nitride UV-detector with graphene electrode on gallium nitride self-supporting substrate involves preparing gallium nitride self-supporting substrate by hydride chemical vapor deposition, depositing aluminum gallium nitride layer of N-type heavily doped high aluminum component on front surface of gallium nitride self-supporting substrate by organic chemical vapor deposition, doping, and forming ohmic contact back electrode by electron beam evaporation on back surface of structure; and preparing graphene Schottky contact on aluminum gallium nitride layer. USE - Method for preparing aluminum gallium nitride UV-detector with graphene electrode on gallium nitride self-supporting substrate (claimed). ADVANTAGE - The detector has high resistivity. It improves UV-light transmittance and solar-blind UV-detector performance. DETAILED DESCRIPTION - Preparation of aluminum gallium nitride UV-detector with graphene electrode on gallium nitride self-supporting substrate comprises preparing gallium nitride self-supporting substrate by hydride chemical vapor deposition, depositing aluminum gallium nitride layer of N-type heavily doped high aluminum component on front surface of gallium nitride self-supporting substrate by organic chemical vapor deposition, doping, and forming ohmic contact back electrode by electron beam evaporation on back surface of structure; preparing graphene Schottky contact on aluminum gallium nitride layer, and preparing circular pattern; and depositing passivation layer at top of entire structure, etching portion of passivation layer to graphene Schottky contact surface, and extending metal contact.