▎ 摘　　要

NOVELTY - The method involves placing carbon source on the surface of the flexible conductive substrate. The carbon-containing substrate is obtained after heating and pressing with a hot pressing roller. The carbon-containing substrate is carbonized. The carbon-containing substrate is activated by an activator, and the conductive carbide is obtained after drying. Both sides of the conductive carbide to be graphitized are compressed using the first belt voltage roller to obtain a graphene film. The graphene film is cleaned and dried to obtain micro-nano porous graphene film with high specific surface area. USE - Processing method for high specific surface area micro-nano porous graphene film. ADVANTAGE - The processing method for high specific surface area micro-nano porous graphene film based on the Joule thermal flash evaporation technology has simple steps, with strong operability. The specific surface area of the graphene film is improved. The processing method is convenient for mass processing. The method uses the unreeling device and rolling device to ensure the continuity and large batch quantity of graphene film processing. The processing cost is reduced. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a processing device of high specific surface area micro-nano porous graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the processing device of high specific surface area micro-nano porous graphene film. 1Unreeling device 2Hot pressing device 3Carbonizing activation device 4Graphitizing device 5Cleaning device 6Drying device 7Rolling device 21First hot pressing roller 22Second hot pressing roller 31Laser emitting assembly 32First scraping assembly 33First drying assembly 41First electriferous pressure roller