▎ 摘　　要

NOVELTY - Cooling wall furnace comprises sequentially connected injection chamber, process chamber and sample chamber. A flanged valve is provided between adjacent chambers for connecting or isolating adjacent chambers. The process chamber sequentially comprises a reaction chamber, a hot plate, a heating layer, an insulation layer and condensing walls from center to the periphery. The reaction chamber is used to receive the rack. The flap valve is a vacuum flap valve. USE - The cooling wall furnace is useful for preparing graphene by chemical vapor deposition method (claimed). DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for continuous preparation of graphene by chemical vapor deposition method in the cooling wall furnace, comprising: (i) maintaining a vacuum state of the whole device, maintaining the temperature of heating layer and the soaking layer of the process chamber to 700-900 degrees C, opening the chamber between the sample chamber and the process chamber, placing the rack with the sample from the sample chamber into the process chamber, closing the insert valve between the sample chamber and the process chamber; (ii) maintaining the process under room temperature, passing reaction gas into the process chamber, growing the graphene film, stopping the ventilation after the end of growth to attain a pressure of less than 10 Pa; and (iii) opening the cabin valve between the sample chamber and the process chamber, placing the rack into the sample chamber, closing the card between the sample chamber and the process chamber, cooling the sample by passing an inert gas into the sample chamber. DESCRIPTION OF DRAWING(S) - The diagram shows a schematic representation of the cooling wall furnace.