▎ 摘　　要

NOVELTY - The method involves providing a first solution (10), which contains metallate or metal ions. A second solution (12), which contains light sensitive reducing agent such as semiconductor nanoparticles is provided. The first solution (10) and the second solution (12) are mixed to form a reagent (14) on a substrate (16). A light source is focused on the reagent to form a mechanically rigid deposition in the focus of the light source. The light source is a laser, especially a continuous wave laser or a pulsed laser, preferentially in the visible range, preferentially with 532 nm wavelength. USE - Method for photon induced material deposition. ADVANTAGE - The reduced graphene oxide fulfils the requirements and performs well. The ink particles are not only are dispersed uniformly inside water, but have nearly identical hydrodynamic diameters down to 100 nm. Therefore, the best performance can be achieved by using this off-the-shelf carbon ink, which reduces the costs of the fabrication of the second solution and thus the total costs. By employing microfluidic chips with multiple channels, depositions with different materials can be simplified further and automated. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a device for photon induced material deposition. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view showing the deposition of material. Aqueous reagent (14) Glass substrate (16) Objective lens (20) Surface (22) Cone (24)