▎ 摘　　要

NOVELTY - The resonator (200) has a substrate (210) that has the properties of ENZ. A graphene plasmon resonator pattern (220) is formed on the substrate. The graphene plasmon resonator pattern generates a plasmon resonance when irradiated with infrared light. The scale of the size of the graphene plasmon resonator pattern is a sub-wavelength relative to the wavelength of the infrared light generating the plasmon resonance. USE - Graphene plasmon resonator used in semiconductor device manufacture. ADVANTAGE - Provides a graphene plasmon resonator that has a graphene plasmon resonator pattern formed on a substrate with ENZ characteristics, such that the graphene plasmon resonator with large size scale can be implemented. Ensures minimized performance degradation due to manufacturing variations. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene plasmon resonator manufacture method. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the graphene plasmon resonator. (Drawing includes non-English language text). Resonator (200) Substrate (210) Graphene plasmon resonator pattern (220)