▎ 摘　　要

NOVELTY - Bis-trimethylolpropane based hyperbranched polymer molecular structure (I) is new. USE - (I) is useful in laser direct imaging hyperbranched polymer based photoresist (claimed) for manufacture of ultra-fine grid lines of photovoltaic cell electrodes. ADVANTAGE - The laser direct imaging photoresist has high sensitivity, high resolution, high adhesion, small shrinkage rate, small warpage deformation and wear resistance. DETAILED DESCRIPTION - Bis-trimethylolpropane based hyperbranched polymer molecular structure of formula (I) is new. INDEPENDENT CLAIMS are included for: preparation of (I); and hyperbranched polymer based photoresist, comprising 60-90 wt.% (I), 0.1-20 wt.% active diluent, 0.5-5 wt.% photoinitiator, 0.1-5 wt.% functional auxiliary agent, and 0.1-30 wt.% nano-filler.