▎ 摘　　要

NOVELTY - The method involves forming a catalyst layer over a silicon substrate. A graphene layer is formed over the catalyst layer. A first capping layer is arranged over a first side of the graphene layer. The catalyst layer and the silicon substrate are removed to expose a second side opposite to the first side. A pellicle frame is arranged on the first capping layer, where thickness of the first capping layer and a second capping layer is thinned by etching an exposed portion. The first or second capping layers are made of silicon carbide, silicon dioxide, six-nitride, silicon chloride, silicon nitride, hexafluoride, boride or lanthanum carbide. A silicon oxide layer is laminated on the substrate. USE - Method for manufacturing a pellicle for extreme ultraviolet lithography. ADVANTAGE - The method enables effectively improving bonding force between the capping layer and the graphene layer, so that simplified process is performed. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating the method for manufacturing the pellicle for extreme ultraviolet lithography (Drawing includes non-English language text).