▎ 摘　　要

NOVELTY - Carbon abrasive comprises a carbon nanoparticle, and a positively charged polymer, and/or a positively charged oligomer disposed on a surface of the carbon nanoparticle. USE - The carbon abrasive is useful for: polishing slurry; manufacturing a semiconductor device (all claimed). ADVANTAGE - The carbon abrasive: exhibits a positive charge in water; and improves a polishing rate while reducing damage and shape deformation of a structure. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a polishing slurry comprising the carbon abrasive; and (2) manufacturing a semiconductor device, comprising forming a first layer (20) comprising a first material on a substrate (10), forming many trenches in the first layer, forming a second layer (30a) comprising a second material on the first layer and inside the trenches, where the second material is different from the first material, and chemical mechanical polishing a surface of the second layer using the polishing slurry. DESCRIPTION OF DRAWING(S) - The figure shows a planarization of the second layer. Substrate (10) First layer (20) Second layer (30a)