• 专利标题:   Improving graphene defect comprises e.g. introducing and soaking mixed fluid with reaction compound and supercritical fluid in graphene powder in reaction tank containing graphene powder and conforming to supercritical fluid environment.
  • 专利号:   CN111943182-A
  • 发明人:   LI Z, TU B, CHEN J, HUANG Y
  • 专利权人:   XSENSE TECHNOLOGY CORP
  • 国际专利分类:   C01B032/182, C01B032/194
  • 专利详细信息:   CN111943182-A 17 Nov 2020 C01B-032/194 202000 Pages: 19 Chinese
  • 申请详细信息:   CN111943182-A CN10403412 15 May 2019
  • 优先权号:   CN10403412

▎ 摘  要

NOVELTY - Improving graphene defect comprises introducing and soaking the mixed fluid with reaction compound and supercritical fluid in the graphene powder in the reaction tank containing graphene powder and conforming to a supercritical fluid environment, where the reaction compound comprises a compound of carbon, hydrogen, nitrogen, silicon or oxygen element to passivate and repair the graphene structure defects of the graphene powder, separating the mixed fluid from the graphene powder, and adsorbing the graphene powder remaining in the mixed fluid with a molecular sieve. USE - The method is useful for improving graphene defect. ADVANTAGE - The method: reduce ratio of structural defects of grapheme, and number of graphene layers; increases composition content of grapheme; and provides graphene powder with good thermal and electrical conductivity. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for graphene powder, comprising nitrogen-hydrogen, carbon-hydrogen, carbon-oxygen, carbon-nitrogen and/or carbon- silicon, where the number of layers of the graphene is 20 layers or less, the 2D/G value of the graphene powder is 0.3-0.6, the G/D value of the graphene powder is 2-4, the 2D/G value and the G/D value are Raman shift 1351 wavenumber (D band) and Raman shift 1587 wave number (G band) analyzed by Raman spectroscopy, and Raman shift 2687 wavenumber (2D band) intensity ratio obtained.