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  • 专利标题:   Preparation of graphene or ultra-thin carbon film by physical vapor deposition comprises putting substrate in deposition chamber, cleaning surface, ionizing to generate carbon-containing cation, depositing on substrate and vacuum annealing.
  • 专利号:   CN103266306-A, CN103266306-B
  • 发明人:   FU D, LIN B, YAN S
  • 专利权人:   YICHANG HOUHUANG VACUUM TECHNOLOGY CO
  • 国际专利分类:   C23C016/26, C23C016/50
  • 专利详细信息:   CN103266306-A 28 Aug 2013 C23C-016/26 201401 Pages: 10 Chinese
  • 申请详细信息:   CN103266306-A CN10190642 22 May 2013
  • 优先权号:   CN10190642

▎ 摘　　要

NOVELTY - Preparation of graphene or ultra-thin carbon film by physical vapor deposition comprises putting substrate in deposition chamber, cleaning surface at temperature of 70-100 degrees C, pressure of 0.5-1 Pa and voltage of - 50 to - 100 V by acetylene-argon mixed gas, ionizing to generate carbon-containing cation, depositing on substrate by electric field and vacuum annealing at 600-900 degrees C for 1-2 hours. USE - Method for preparing graphene or ultra-thin carbon film by physical vapor deposition (claimed).