• 专利标题:   Multi-layer hole metallization involves ball milling graphene, dispersant, solvent, and water, mixing with metal nanowire dispersion, conductive polymer, and thixotropic agent, forming conductive paste, treating multilayer plate with conductive paste, micro-etching, and treating with antioxidant.
  • 专利号:   CN113382560-A
  • 发明人:   HU L
  • 专利权人:   HU L
  • 国际专利分类:   H05K003/42, H05K001/09
  • 专利详细信息:   CN113382560-A 10 Sep 2021 H05K-003/42 202185 Pages: 7 Chinese
  • 申请详细信息:   CN113382560-A CN10155772 09 Mar 2020
  • 优先权号:   CN10155772

▎ 摘  要

NOVELTY - Multi-layer hole metallization involves mixing 8-10 wt.% graphene, 0.5-1 wt.% dispersant, 4-5.5 wt.% solvent, and water, ball milling into a graphene slurry having 14-15 wt.% solid content, mixing with 0.1-0.2 wt.% metal nanowire dispersion liquid, 9-10 wt.% polymeric conductive material, 0.5-0.9 wt.% thixotropic agent, high-speed dispersing into a stable conductive paste having 24-25 wt.% solid content, cleaning multilayer plate, washing, treating with conductive paste, drying, micro etching, washing, treating with an antioxidant, washing and drying. USE - Multi-layer hole metallization. ADVANTAGE - The method enables simple, easy to control, economical, environmentally-friendly, pollution-free multi-layer hole metallization of multilayer plate having stable performance, excellent conductivity, and strong bonding force.