▎ 摘　　要

NOVELTY - The method of modifying a substrate during printing of a perovskite film, involves mixing a polyakenoate and an organic solvent to obtain a polyalkenoate solution, where concentration of the polyalkenoate solution is less than 12 mg/mL, and then spin-coating the polyalkenoate solution on the surface of the substrate. The polyalkenoate is polymethyl methacrylate. The organic solvent is n-butyl acetate, dibutyl diacetate, dichloromethane, dichloroethane, chloroform, acetone, methyl ethyl ketone, benzene, chlorobenzene or ethyl acetate. USE - Method of modifying a substrate e.g. silicon, glass, polyethylene terephthalate or polyethylene naphthalate during printing of a perovskite film used in the manufacture of an optoelectronic device (claimed) such as polymer photoelectric devices, bioelectronics, organic electronics, carbon nanotube graphene devices and micro-electro-mechanical systems, and for multiple construction of different materials, positioning quantitative micro-nano repair, and manufacture of various material films. ADVANTAGE - The substrate (silicon or silica) is modified by applying a voltage using polymethyl methacrylate, so that the perovskite film is printed on the modified substrate. The perovskite film has clear and uniform boundaries, good compactness and coverage degree, and the defect state is reduced. DESCRIPTION OF DRAWING(S) - The drawing shows a scanning electron microscope image of the perovskite film produced on the substrate.