• 专利标题:   Manufacture of molded filter material involves forming support layer on graphene layer formed on initial stage substrate for graphene, forming water passage hole in support layer, and forming water passage hole in graphene layer.
  • 专利号:   WO2016024506-A1, TW201615270-A, AU2015302719-A1, IN201737003969-A, CN106714948-A, JP2016542543-X, EP3187250-A1, VN52294-A, US2017232397-A1, EP3187250-A4, US9968890-B2, ID201802060-A, TW641420-B1, TW201906664-A, JP6545688-B2, JP2019162635-A, AU2015302719-B2
  • 发明人:   KANEKO K, TAKAGI T, MURATA K, MURADA K, TAKAGE T, TAKAGI H
  • 专利权人:   UNIV SHINSHU, KOTOBUKI TSUSHOU CO LTD, UNIV SHINSHU, KOTOBUKI TSUSHOU CO LTD, UNIV SHINSHU, KOTOBUKI TSUSHOU CO LTD, KOTOBUKI TSUSHO KK
  • 国际专利分类:   B01D069/10, B01D069/12, B01D071/02, C01B031/02, B01J020/20, C01B032/194, B01D067/00, G03F007/038, G03F007/16, G03F007/20, G03F007/32, G03F007/40, C01B032/05
  • 专利详细信息:   WO2016024506-A1 18 Feb 2016 B01D-071/02 201617 Japanese
  • 申请详细信息:   WO2016024506-A1 WOJP072206 05 Aug 2015
  • 优先权号:   JP163350, WOJP072206

▎ 摘  要

NOVELTY - A layer (6) of a support material is formed on the surface of a layer of graphene (1) formed on an initial stage substrate for graphene. A water passage hole is formed in the layer of the support material. The initial stage substrate for graphene is removed. A water passage hole is formed in the graphene layer by carrying out low temperature heating and retaining the graphene layer in air containing oxygen at 160-250 degrees C for predetermined time, to obtain a molded filter material which has a graphene layer as filter medium. USE - Manufacture of molded filter material (claimed). ADVANTAGE - The method enables efficient manufacture of molded filter material having water passage holes of required size, without damaging support material and graphene pollution. DESCRIPTION OF DRAWING(S) - The drawing shows the explanatory view of manufacture of molded filter material. Graphene (1) Copper foil (2) Film resist (3) Resist layer (5) Support layer (6)