• 专利标题:   Graphene FET, has drain electrode contact layer placed on substrate, and source contact layer and bottom drain contact, which are located at left and right sides of grid metal layer.
  • 专利号:   CN103579350-A, CN103579350-B
  • 发明人:   QIAN H, WU H, LV H
  • 专利权人:   UNIV TSINGHUA
  • 国际专利分类:   H01L021/336, H01L029/10, H01L029/78
  • 专利详细信息:   CN103579350-A 12 Feb 2014 H01L-029/78 201426 Pages: 8 Chinese
  • 申请详细信息:   CN103579350-A CN10503580 23 Oct 2013
  • 优先权号:   CN10503580

▎ 摘  要

NOVELTY - The transistor has a substrate provided with a bottom source electrode contact, a bottom drain contact and a gate metal layer. A source layer and a drain electrode contact layer are placed on the substrate. A source contact layer and the bottom drain contact are located at left and right sides of the grid metal layer. A gate dielectric layer is located on the grid metal layer. A graphene film is placed on a bottom layer source contact. USE - Graphene FET. ADVANTAGE - The FET has high mobility and better grid-control ability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for manufacturing a graphene FET. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a graphene FET.