• 专利标题:   Manufacture of graphene on polycrystalline silicon carbide used as bearing element in mechanical engineering, involves polishing silicon carbide components, cleaning, and graphitizing polished surface by annealing.
  • 专利号:   DE102011056896-A1, WO2013091617-A2, WO2013091617-A3
  • 发明人:   BENNEWITZ R, ASLAN M, WAEHLISCH C F
  • 专利权人:   LEIBNIZ INST NEUE MATERIALIEN GEMEINNUET
  • 国际专利分类:   C04B035/565, C04B041/80, F16C033/00, C01B031/04
  • 专利详细信息:   DE102011056896-A1 27 Jun 2013 C04B-041/80 201344 Pages: 5 German
  • 申请详细信息:   DE102011056896-A1 DE10056896 22 Dec 2011
  • 优先权号:   DE10056896

▎ 摘  要

NOVELTY - Surfaces of silicon carbide components is polished with homogeneous distribution of carbon, and cleaned. At least one polished surfaces subjected to graphitization process by performing annealing process at 1500-1700 degrees C for 10-20 minutes under argon atmosphere. Thus, graphene is manufactured on polycrystalline silicon carbide. USE - Manufacture of graphene on polycrystalline silicon carbide used as bearing element e.g. micropositioning slide bearing in mechanical engineering (claimed). ADVANTAGE - The method efficiently provides graphene-containing polycrystalline silicon carbide having low friction.