• 专利标题:   Device useful for processing graphene by plasma surface modification comprises e.g. vacuum chamber provided with air charging hole and air pumping hole, and counter electrode connected with radio frequency power supply system.
  • 专利号:   WO2021026888-A1
  • 发明人:   ZHANG B, JIN X, ZHU L, YU W, MA W, NIE J, LIU K
  • 专利权人:   CHANGZHOU MECHATRONIC TECHNOLOGY VOCATIO
  • 国际专利分类:   B01J019/08, C01B032/194, H01J009/02, H05H001/42
  • 专利详细信息:   WO2021026888-A1 18 Feb 2021 H05H-001/42 202119 Pages: 14 Chinese
  • 申请详细信息:   WO2021026888-A1 WOCN100790 15 Aug 2019
  • 优先权号:   WOCN100790

▎ 摘  要

NOVELTY - Device comprises a vacuum chamber (1), a glass container (2), a radio frequency power supply system, a counter electrode and a rotating mechanism. The vacuum chamber is a horizontal structure, and is provided with an air charging hole (5) and an air pumping hole (6). The counter electrode is connected with the radio frequency power supply system, and has a circular arc structure, the inner arc part is a discharge layer, the middle part is an insulating layer, and the outer arc part is a shielding layer. The middle of the counter electrode is provided with the cylindrical glass container. The counter electrode is fixed on the inner wall of the vacuum chamber through a polytetrafluoroethylene block and is coaxial with the center of glass container. The glass container is connected with the rotating mechanism, and one end is provided with a through hole. USE - The device is useful for processing graphene (claimed) by plasma surface modification. ADVANTAGE - The device improves the hydrophilicity of the graphene surface, which is good for realizing the modification treatment of the graphene surface; and has reasonable structure, good stability, simple operation. The method is pure physical method modified, is environmentally-friendly, without introducing surfactant or surface active substance; processing result has good repeatability; and has high production efficiency. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for processing graphene using the device, comprising (i) placing the graphene to be processed into the glass container, closing the container end enclosure and the vacuum chamber end enclosure, starting an air pumping control system and maintaining the degree of vacuum of the bottom of the vacuum chamber at 0.01-1 Pa; (ii) opening the ventilation control system and filling with mixed gas, maintaining the vacuum chamber under pumping and charging state, and keeping the vacuum chamber in the working vacuum degree stable at 10-20 Pa, opening the radio frequency power supply system, so that the glow discharge region is bound in the glass container; (iii) starting the driving motor, driving the glass container to rotate by the transmission of the rotating shaft, and driving the graphene placed in the glass container to roll continuously in the glow discharge area, where the processing time is 2-5 minutes and the discharging radio frequency power is 80-120 W; and (iv) closing the radio frequency power supply system, ventilation control system and air pumping control system, introducing air to atmospheric pressure and taking out the processed graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of device for processing graphene by plasma surface modification. Vacuum chamber (1) Glass container (2) Air charging hole (5) Air pumping hole (6)